| 摘要 |
PROBLEM TO BE SOLVED: To make the processing of a substrate 10 uniform as much as possible over the whole substrate, while holding the substrate 10 with a topping up roller. SOLUTION: A substrate processing device comprises conveyance mechanisms 11 conveyed in the state where substrate 10 is made to incline, and a processing solution feeder which supplies a processing solution to the front side surface of the substrate 10. The conveyance mechanisms 11 have the lower receiving roller 13 which is rotatably formed in a first axis 15 prolonged in an oblique direction of the substrate 10, and supports a rear side surface of the substrate 10; and the topping up roller 14 which is rotatably formed in a second axis 16 prolonged in parallel with the first axis 15, and supports a front side surface of the substrate 10. The topping up roller 14 has openings 22 where penetration formation is carried out in the direction of the second axis 16. COPYRIGHT: (C)2007,JPO&INPIT
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