发明名称 ELECTROLESS-PLATED NICKEL FILM, MACHINE COMPONENT HAVING THE FILM, AND ELECTROLESS PLATING BATH
摘要 PROBLEM TO BE SOLVED: To provide a plating film which has high hardness in a wide temperature range between room temperature and a high-temperature region, is superior in slidability and toughness and can be formed at a high speed, and to provide a machine component of which the sliding part is coated with the plating film, has the high hardness in the wide temperature range and is superior in the slidability. SOLUTION: The electroless-plated nickel film includes 1-50 mass% Co, 1-20 mass% W and 1-5 mass% P. The machine component has a sliding part. At least, the sliding part is coated with the film. The electroless plating bath includes Ni ions of 0.03 to 0.1 mol/L, Co ions of 0.01 to 0.05 mol/L, WO<SB>4</SB>ions of 0.01 to 0.05 mol/L and a phosphorus compound of 0.15 to 0.30 mol/L. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007162069(A) 申请公布日期 2007.06.28
申请号 JP20050359762 申请日期 2005.12.14
申请人 NIPPON KANIZEN KK 发明人 WATANABE SUMITAKA
分类号 C23C18/36 主分类号 C23C18/36
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