发明名称 |
Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus |
摘要 |
An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
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申请公布号 |
US2007146664(A1) |
申请公布日期 |
2007.06.28 |
申请号 |
US20050314157 |
申请日期 |
2005.12.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZAAL KOEN JACOBUS J.M.;JACOBS JOHANNES H.W.;LOOPSTRA ERIK R.;OTTENS JOOST J.;DE JONG FREDERIK E. |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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