发明名称 Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus
摘要 An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
申请公布号 US2007146664(A1) 申请公布日期 2007.06.28
申请号 US20050314157 申请日期 2005.12.22
申请人 ASML NETHERLANDS B.V. 发明人 ZAAL KOEN JACOBUS J.M.;JACOBS JOHANNES H.W.;LOOPSTRA ERIK R.;OTTENS JOOST J.;DE JONG FREDERIK E.
分类号 G03B27/42 主分类号 G03B27/42
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