| 摘要 |
A device for gas cleaning which has means for controlling the thickness of a fluidized bed of an absorption liquid in a more stable manner as compared with the conventional technology is provided. As a device for separating gaseous pollutants such as sulphur dioxide from a gas by means of an absorption liquid, comprising: (a) an inlet for a gas containing at least one gaseous pollutant and an outlet for a gas separated from the at least one gaseous pollutant; (b) an essentially horizontal punched plate(8) which is mounted between the inlet and the outlet and arranged on an upper surface(12) to permit passage of the gas containing the at least one gaseous pollutant from a lower part of the essentially horizontal punched plate and transport a fluidized bed(14) of the absorption liquid; (c) an inlet zone for distributing the absorption liquid over the punched plate to form the fluidized bed of the absorption liquid; and (d) an outlet zone(68) for receiving the fluidized bed of the absorption liquid after the absorption liquid passes through the punched plate, the device comprises: (e) a fixed barrier(76) which is disposed in the outlet zone and extends in a vertical upward direction from the punched plate; and (f) a controllable throttle means(80) which is disposed above the fixed barrier and configured to control the amount of resistance that the fluidized bed of the absorption liquid is required to overcome so as to pass through the fixed barrier.
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