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发明名称
Mask for forming isolated pattern and method of forming the isolated pattern using the same
摘要
申请公布号
KR100732757(B1)
申请公布日期
2007.06.27
申请号
KR20050041821
申请日期
2005.05.18
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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