| 摘要 |
An optical data processing apparatus using a vertical cavity surface emitting laser device with a large oxide aperture is provided to improve manufacturing yield by reducing deviation of the aperture of each wafer. An optical data processing apparatus using a vertical cavity surface emitting laser device with a large oxide aperture includes a light source. The light source includes at least one vertical cavity surface emitting laser device to irradiate laser. At least one vertical cavity surface emitting laser device includes an active area and a current confined part between first and second mirrors. The aperture larger than approximately 4 micron is formed on the current confined part for injecting current. |
