CHEMICAL VAPOR DEPOSITION OF ELECTRO LUMINESCENCE DEVICE
摘要
A chemical deposition apparatus for an electroluminescence device is provided to uniform the film quality of a passivation film by increasing the number of a gas outlet holes relative to the number of buffers. A chemical deposition apparatus includes a gas nozzle part(400) for forming a passivation film on an electroluminescence device. The gas nozzle part has a gas inlet port(401) introducing gas into the electroluminescence device, plural buffers(403) formed on the gas inlet port for accumulating the gas, plural gas blowing holes(405) blowing a predetermined quantity of the gas accumulated in the buffers during a given time, and plural gas outlet ports(407) discharging the gas onto the electroluminescence device.
申请公布号
KR20070066678(A)
申请公布日期
2007.06.27
申请号
KR20050128122
申请日期
2005.12.22
申请人
LG ELECTRONICS INC.
发明人
LEE, HO NYUN;KIM, CHANG NAM;CHUNG, JIN WON;KANG, SUN KIL;YANG, WON JAE;KIM, HONG GYU;SHIN, YOUNG HOON;KIM, DO YOUL;JUNG, MYUNG JONG;KIM, SANG KYOON