发明名称 MARKING METHOD FOR SEMICONDUCTOR WAFER
摘要 <p>A plurality of minute ID marks are inscribed on a semiconductor wafer which is under manufacture, without imposing adverse effect to the wafer, in order to make the marks less susceptible to surface treatment to be performed during the course of manufacture. Further, the minute ID marks act as mutual backups. Inscribing such minute ID marks on a semiconductor wafer prevents confusion due to effacement of ultra-minute marks and eliminates worry about the impossibility of tracing a semiconductor wafer.</p>
申请公布号 KR100732571(B1) 申请公布日期 2007.06.27
申请号 KR20000059396 申请日期 2000.10.10
申请人 发明人
分类号 H01L21/02;G06K1/12;G06K19/06;H01L23/544 主分类号 H01L21/02
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