Method for fabricating recess gate in semiconductor device,申请号KR20050028292-传众专利搜索

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发明名称	Method for fabricating recess gate in semiconductor device
摘要
申请公布号	KR100732755(B1)	申请公布日期	2007.06.27
申请号	KR20050028292	申请日期	2005.04.04
申请人		发明人
分类号	H01L21/336	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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