发明名称 |
METHOD FOR FABRICATING A ZNS BASED LIGHT EMITTING DEVICE AND A ZNS BASED LIGHT EMITTING DEVICE FABRICATED BY THE METHOD |
摘要 |
A method for manufacturing a ZnS light emitting device and the ZnS light emitting device manufactured using the same are provided to reduce lattice unconformity between a AlxInyGa1-x-yN semiconductor layer and a porous silicon substrate by using the porous silicon substrate as a substrate in order to grow the AlxInyGa1-x-yN semiconductor layer. A porous silicon substrate(100) is prepared. A p-type semiconductor layer(400) that is AlxInyGa1-x-yN(0 x,y,x+y 1) compound semiconductor material is formed on the porous silicon substrate. A ZnO(zinc oxide) active layer(500) is formed on the p-type semiconductor layer. An n-type blende(ZnS) semiconductor layer(600) is formed on the ZnO active layer. The n-type blende(ZnS) semiconductor layer, the ZnO active layer, and a part of the p-type semiconductor layer are etched to expose the part of the p-type semiconductor layer. Electrodes(700,800) are formed on the n-type blende(ZnS) semiconductor layer and the exposed p-type semiconductor layer.
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申请公布号 |
KR100734809(B1) |
申请公布日期 |
2007.06.27 |
申请号 |
KR20060048737 |
申请日期 |
2006.05.30 |
申请人 |
SEOUL OPTO DEVICE CO., LTD. |
发明人 |
HAN, CHANG SEOK;KIM, KYUNG HAE |
分类号 |
H01L33/26 |
主分类号 |
H01L33/26 |
代理机构 |
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