Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units

摘要

A lithographic system combining an interference exposure unit (10) and a lithography unit. The lithography unit can comprise an array of individually controllable elements (PD). The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.