发明名称 EVAPORATING APPARATUS
摘要 A deposition apparatus is provided to prevent abrupt temperature change between inner and outer portions of a hole above an upper portion of a furnace, thereby preventing the hole from being plugged by vaporized deposition material around the hole. A furnace(114) has an opened upper portion, and accommodates deposition material therein. A heat wire(112) is rigidly attached to an outer periphery of the furnace to supply heat to the furnace. A cap member(140) is coupled to an upper end of the furnace, and is provided with holes for spraying the deposition material heated by the heat wire. A disc-type reflector(150) is rigidly attached to an upper surface of the cap member, and has a hole formed at a center portion thereof.
申请公布号 KR20070066232(A) 申请公布日期 2007.06.27
申请号 KR20050127145 申请日期 2005.12.21
申请人 SAMSUNG SDI CO., LTD. 发明人 RYU, SEOUNG YOON
分类号 H05B33/10;C23C14/12 主分类号 H05B33/10
代理机构 代理人
主权项
地址