| 摘要 |
An apparatus, system, and method are disclosed for utilizing a "shadow mask" approach to fabricate servo patterns on high density patterned media. The apparatus may include a deposition mask having a plurality of apertures generated by a conventional lithographic process. Material may be deposited onto a substrate through the deposition mask apertures from at least one deposition source oriented at unique deposition angles. In this manner, each aperture may correspond to multiple deposition locations. Apertures may be precisely dimensioned and positioned to create servo pattern features from the resulting deposition locations. The deposition mask may also include a plurality of bit pattern apertures adapted to direct a material to a plurality of deposition locations on the substrate, the deposition locations forming a bit pattern concurrent with formation of a servo pattern.
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