发明名称 Thin film structure from LILAC annealing
摘要 A system and method are provided for reducing film surface protrusions in the fabrication of LILAC films. The method comprises: forming an amorphous film with a first thickness; annealing the film using a LILAC process, with beamlets having a width in the range of 3 to 10 microns; in response to annealing, forming protrusions on the film surface; optionally oxidizing the film surface; thinning the film; and, in response to thinning the film, smoothing the film surface. Typically, the film surface is smoothed to a surface flatness of 300 Å, or less. In some aspects of the method, oxidizing the film surface includes oxidizing the film surface to a depth. Then, thinning the film includes thinning the film to a third thickness equal to the first thickness minus the depth.
申请公布号 US7235811(B2) 申请公布日期 2007.06.26
申请号 US20040755487 申请日期 2004.01.12
申请人 SHARP LABORATORIES OF AMERICA, INC. 发明人 CROWDER MARK A.;VOUTSAS APOSTOLOS T.;ADACHI MASAHIRO
分类号 H01L29/04;H01L21/20;H01L21/336;H01L29/786 主分类号 H01L29/04
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