| 摘要 |
<p>A semiconductor exposure apparatus is provided to improve product qualities by aligning exactly a reticle stage and a wafer stage using an align unit composed of a position detecting part and a controller. A semiconductor exposure apparatus includes a reticle stage, a wafer stage, a position detecting part and a controller. The reticle stage(100) is capable of being moved along X and Y axes by using a first driving unit. The wafer stage(200) is installed under the reticle stage. The wafer stage is capable of being moved along the X and Y axes by using a second driving unit. The position detecting part is capable of detecting the positions of the reticle stage and the wafer stage in real time. The controller(500) is used for aligning exactly the reticle stage and the wafer stage by controlling the first and the second driving units according to detection signals of the position detecting part. The control detecting part is composed of a first detecting portion(300) for the reticle stage and a second detecting portion(400) for the wafer stage.</p> |
