发明名称 |
Film pattern formation method, device and method for manufacturing the same, electro-optical device, electronic device, and method for manufacturing active matrix substrate |
摘要 |
A method for forming a film pattern on a substrate includes the steps of: forming banks on the substrate; and making liquid drops of functional liquid land on the substrate to dispose the liquid drops in an area partitioned by the banks, wherein a spacing between the liquid drops are determined so that the liquid drops connect together after they land on the substrate, and a position in which a liquid drop of the liquid drops which lands the closest to an end of the area is spaced from the end of the area by less than a half of the spacing between the liquid drops.
|
申请公布号 |
US7235415(B2) |
申请公布日期 |
2007.06.26 |
申请号 |
US20040848604 |
申请日期 |
2004.05.19 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
MIKOSHIBA TOSHIAKI |
分类号 |
G02F1/1368;H01L21/00;B05D1/26;B05D5/12;B05D7/00;B41J2/14;C23C4/12;C23C26/02;G02F1/1345;G09F9/00;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L29/786;H01L51/00;H01L51/40;H01L51/50;H05B33/10;H05K3/12 |
主分类号 |
G02F1/1368 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|