发明名称 Film pattern formation method, device and method for manufacturing the same, electro-optical device, electronic device, and method for manufacturing active matrix substrate
摘要 A method for forming a film pattern on a substrate includes the steps of: forming banks on the substrate; and making liquid drops of functional liquid land on the substrate to dispose the liquid drops in an area partitioned by the banks, wherein a spacing between the liquid drops are determined so that the liquid drops connect together after they land on the substrate, and a position in which a liquid drop of the liquid drops which lands the closest to an end of the area is spaced from the end of the area by less than a half of the spacing between the liquid drops.
申请公布号 US7235415(B2) 申请公布日期 2007.06.26
申请号 US20040848604 申请日期 2004.05.19
申请人 SEIKO EPSON CORPORATION 发明人 MIKOSHIBA TOSHIAKI
分类号 G02F1/1368;H01L21/00;B05D1/26;B05D5/12;B05D7/00;B41J2/14;C23C4/12;C23C26/02;G02F1/1345;G09F9/00;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L29/786;H01L51/00;H01L51/40;H01L51/50;H05B33/10;H05K3/12 主分类号 G02F1/1368
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