发明名称 |
Agent for forming coating for narrowing patterns and method for forming fine pattern using the same |
摘要 |
It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between the adjacent photoresist patterns is lessened, further characterized by containing a water-soluble polymer and a surfactant. Also disclosed is a method of forming fine-line patterns using the over-coating agent. According to the invention, one can obtain fine-line patterns which exhibit good profiles while satisfying the characteristics required of semiconductor devices, being excellent in controlling the dimension of patterns.
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申请公布号 |
US7235345(B2) |
申请公布日期 |
2007.06.26 |
申请号 |
US20040471772 |
申请日期 |
2004.03.02 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SUGETA YOSHIKI;KANEKO FUMITAKE;TACHIKAWA TOSHIKAZU |
分类号 |
G03C5/00;G03F7/40;H01L21/027 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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