发明名称 |
PHOTOSENSITIVE COMPOSITION, IMAGE-FORMING BASE MATERIAL, IMAGE-FORMING MATERIAL, AND IMAGE-FORMING METHOD |
摘要 |
<p>Disclosed is a photosensitive composition which is highly sensitive to laser light, particularly to laser light from ultraviolet to blue-violet, and is excellent in long-term storage stability and adhesion to a substrate. The photosensitive composition is suitably used as a solder resist or a dry film, and in particular it is suitable for direct drawing wherein laser light from ultraviolet to blue-violet is used. Also disclosed are an image-forming base material using such a photosensitive composition, an image-forming material and an image-forming method. Specifically disclosed is a photosensitive composition containing an ethylenically unsaturated group-containing compound (A), a photopolymerization initiator (B) and an alkali-soluble resin (C) which is characterized in that the photopolymerization initiator (B) contains a photopolymerization initiator having a specific structure and an average particle diameter of not less than 0.001 mum and not more than 150 mum.</p> |
申请公布号 |
KR20070065889(A) |
申请公布日期 |
2007.06.25 |
申请号 |
KR20077008942 |
申请日期 |
2007.04.19 |
申请人 |
MITSUBISHI CHEMICAL CORPORATION |
发明人 |
URANO TOSHIYUKI;KAMEYAMA YASUHIRO;MIZUKAMI JUNJI |
分类号 |
G03F7/031;G03F7/004;G03F7/032;G03F7/033 |
主分类号 |
G03F7/031 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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