发明名称 PHOTOSENSITIVE COMPOSITION, IMAGE-FORMING BASE MATERIAL, IMAGE-FORMING MATERIAL, AND IMAGE-FORMING METHOD
摘要 <p>Disclosed is a photosensitive composition which is highly sensitive to laser light, particularly to laser light from ultraviolet to blue-violet, and is excellent in long-term storage stability and adhesion to a substrate. The photosensitive composition is suitably used as a solder resist or a dry film, and in particular it is suitable for direct drawing wherein laser light from ultraviolet to blue-violet is used. Also disclosed are an image-forming base material using such a photosensitive composition, an image-forming material and an image-forming method. Specifically disclosed is a photosensitive composition containing an ethylenically unsaturated group-containing compound (A), a photopolymerization initiator (B) and an alkali-soluble resin (C) which is characterized in that the photopolymerization initiator (B) contains a photopolymerization initiator having a specific structure and an average particle diameter of not less than 0.001 mum and not more than 150 mum.</p>
申请公布号 KR20070065889(A) 申请公布日期 2007.06.25
申请号 KR20077008942 申请日期 2007.04.19
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 URANO TOSHIYUKI;KAMEYAMA YASUHIRO;MIZUKAMI JUNJI
分类号 G03F7/031;G03F7/004;G03F7/032;G03F7/033 主分类号 G03F7/031
代理机构 代理人
主权项
地址