METHOD FOR EXPOSURE OF TOPOGRAPHIC EXPRESSION WITH USING OF MATRIX ROWS WHICH HAVE AUTOELECTRONIC RADIATORS OF DIFFERENT DIMENSIONS

摘要

The utility model relates to microelectronic technique. The method for exposure of topographic expression with using of matrix rows which have autoelectronic radiators of different dimensions that includes moveable semiconductor wafer covered with photoresist, which is exhibited with controlled electron radiation of radiators matrix. For enhancing of exposure speed of semiconductor wafer it is used matrix rows of different dimensions.