| 摘要 |
<p>A coating drying processing system and a method are provided to transfer substrates continuously applied in a coating processing unit and separately dry the substrate in each drying processing unit, thereby improving throughput thereof. A coating drying processing system includes a substrate transfer path(A) for transferring a wafer in a horizontal direction. A coating processing unit(24) for applying a coating solution onto the substrate and plural drying processing units(26) for drying the substrate are installed on the substrate transfer path from an upward side to a downward side. Each drying processing unit has a function of passing the substrate through the downward side without processing the substrate, and a function of drying the substrate.</p> |
