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发明名称
PROCEDE DE FABRICATION DE SUBSTRAT, ET SUBSTRAT
摘要
申请公布号
FR2884046(B1)
申请公布日期
2007.06.22
申请号
FR20050003174
申请日期
2005.03.31
申请人
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES SOCIETE ANONYME
发明人
MAZURE CARLOS;BOURDELLE KONSTANTIN
分类号
H01L21/20
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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