| 摘要 |
A method for manufacturing a color filter substrate is provided to decrease the number of mask processes and reduce the manufacturing cost, by exposing a photoresist film through exposure processes using different light amounts so as to simultaneously form a pattern spacer and a planarization layer. A black matrix(132) is formed to define cell regions on an upper substrate(111). Color filters are formed in respective cell regions defined by the black matrix. A photoresist film is formed on the resultant substrate including the black matrix and the color filters. The photoresist film is exposed to light having a light amount of 15-40%. A mask is aligned above the photoresist film, wherein the mask has an opening positioned correspondingly to a pattern spacer. The photoresist film is exposed to light having a light amount of 100% by using the mask. The photoresist film is developed to simultaneously form the pattern spacer and a planarization layer. The pattern spacer has a first height, and the planarization layer has a second height lower than the first height. |
