发明名称 Semiconductor device having a surface conducting channel and method of forming
摘要 A semiconductor device including a metal oxide layer, a channel area of the metal oxide layer, a preservation layer formed on the channel area of the metal oxide layer, and at least two channel contacts coupled to the channel area of the metal oxide layer, and a method of forming the same.
申请公布号 US2007141789(A1) 申请公布日期 2007.06.21
申请号 US20050313341 申请日期 2005.12.20
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 KIESEL PETER;SCHMIDT OLIVER;GEIS ARND W.W.;JOHNSON NOBLE M.
分类号 H01L21/336 主分类号 H01L21/336
代理机构 代理人
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