发明名称 |
SURFACE INSPECTION APPARATUS AND SURFACE INSPECTION METHOD |
摘要 |
<p>Defects of repeated patterns on a surface are excellently inspected by reducing influence of a base. The surface inspection apparatus is provided with a means (13) for irradiating the repeated patterns on the surface of an object (20) to be inspected with illuminating light (L1); means (11, 12) for setting an angle formed by a direction on the surface of an incidence plane including an irradiation direction of the illuminating light and a normal (1A) to the surface, and the repeating direction of the repeated patterns, at a prescribed value other than 0; a light receiving means (14) which receives specular reflection light generated from the repeated patterns when the illuminating light is applied and outputs information relating to light intensity of the specular reflection light; and a detecting means (15) which detects defects of the repeated patterns based on the information outputted from the light receiving means. A conditional expression (?/[2cos(? sinf)]>p) is satisfied, where, f is an angle formed by the direction of the incidence plane on the surface and the repeating direction, ? is an angle formed by the irradiation direction of the illuminating light and the normal line to the surface, ? is a wavelength of the illuminating light, and p is a pitch of the repeated patterns.</p> |
申请公布号 |
WO2007069457(A1) |
申请公布日期 |
2007.06.21 |
申请号 |
WO2006JP323833 |
申请日期 |
2006.11.29 |
申请人 |
NIKON CORPORATION;OOMORI, TAKEO;FUKAZAWA, KAZUHIKO;HIROSE, HIDEO |
发明人 |
OOMORI, TAKEO;FUKAZAWA, KAZUHIKO;HIROSE, HIDEO |
分类号 |
G01N21/956;G01B11/30;G03F7/20;H01L21/027;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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