发明名称 ALIGNER AND ALIGNING METHOD
摘要 <p>An aligner and an aligning method by which the cost of a photomask can be reduced and the time required for aligning the photomask can be shortened. On a photomask (1a), a translucent pattern (11) capable of transmitting light energy is arranged continuously along a specific direction. While moving the photomask and a substrate (3) continuously and relatively along the arranging direction of the translucent pattern (11), the photomask (1a) and the substrate (3) are irradiated with light energy every time when they are moved by a distance equal to an integer time of the arrangement pitch of the translucent pattern.</p>
申请公布号 WO2007069480(A1) 申请公布日期 2007.06.21
申请号 WO2006JP324084 申请日期 2006.12.01
申请人 SHARP KABUSHIKI KAISHA;TANIGUCHI, HIDEO;YAMADA, SHIGEYUKI;OKETANI, TAIMI 发明人 TANIGUCHI, HIDEO;YAMADA, SHIGEYUKI;OKETANI, TAIMI
分类号 G03F7/20;G01B11/00;G01B11/26;G03F1/08;G03F9/00;H01L21/027 主分类号 G03F7/20
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