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发明名称
Verfahren zur Erzeugung von Isolatorstrukturen in einem Halbleitersubstrat
摘要
申请公布号
DE10350689(B4)
申请公布日期
2007.06.21
申请号
DE20031050689
申请日期
2003.10.30
申请人
INFINEON TECHNOLOGIES AG
发明人
O'RIAIN, RYAN;RADECKER, JOERG;SPERLICH, HANS-PETER
分类号
H01L21/762
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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