发明名称 |
Lithography apparatus and method utilizing pendulum interferometer system |
摘要 |
Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
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申请公布号 |
US2007139635(A1) |
申请公布日期 |
2007.06.21 |
申请号 |
US20060546368 |
申请日期 |
2006.10.12 |
申请人 |
NIKON CORPORATION |
发明人 |
BINNARD MICHAEL B.;WATSON DOUGLAS C.;NOVAK W. T.;HORIKAWA HIROTO;NAKAKOJI YOSHIFUMI;SAKAMOTO HIDEAKI |
分类号 |
G03B27/80 |
主分类号 |
G03B27/80 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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