| 摘要 |
A gas supply apparatus including a bubbler is provided to supply a constant volume of a source material into a chamber by maintaining a vaporized amount of the source material constantly even when a remaining amount thereof is decreased. A gas supply apparatus includes a bubbler(110) vaporizing a source material(30), a chamber(20) processing a substrate therein, a gas supply tube(140), and a carrier gas supply tube(120) having an end dipped in the source material stored in the bubbler. The carrier gas supply tube has a body(122) extending from an upper portion of the bubbler downward, and a spraying portion(124) coupled to a lower end of the body having horizontal coordinates.
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