| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for production of ultrapure water for an immersion exposure system which prevent the occurrence of nano-size bubbles and roughness on a resist. <P>SOLUTION: Ultrapure water treated by an ultrapure water production device and fed to a semiconductor manufacturing process as washing water is dispensed and passed through a degassing membrane to be degassed to a dissolved nitrogen of ≤3 mg/L, and a dissolved oxygen of ≤50 μg/L. The degassed ultrapure water is passed through an ion exchanger and an ultrafiltration membrane to remove ion components and fine particles in the ultrapure water. <P>COPYRIGHT: (C)2007,JPO&INPIT |
