发明名称 SCAN EXPOSURE SYSTEM, SCAN EXPOSURE METHOD, PROGRAM, AND IMAGE-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To highly efficiently inhibit the consistency unevenness by the reciprocity failure generated in a multibeam contiguity exposure method taking also the influence of the reciprocity failure of a main scan direction into consideration and to aim at the improvement in the image quality. SOLUTION: In the four multibeam contiguity exposure of LD 0-3, in every scan period of two line shifts, the pixel alternately carrying out the lighting control of the pixels of the even number data and odd number data into a main scan and sub-scanning direction is changed, and one line is written by two scans. According to this lighting control, even in the presence of data in the vicinity pixels which adjoin in the main and sub scanning direction, since these pixels do not light by the same scan, the consistency change does not localize by equally giving the influence of the reciprocity failure into the main and sub scanning direction, and thereby it becomes possible to inhibit the consistency unevenness highly efficiently. In addition, the number of pixels having data in the vicinity for every pixel is investigated, the exposure quantity is compensated according to this result, and thereby the consistency unevenness in the case where the image influenced by the reciprocity failure and the image not influenced are intermingled is reduced further. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007152908(A) 申请公布日期 2007.06.21
申请号 JP20050355222 申请日期 2005.12.08
申请人 RICOH CO LTD 发明人 OYAMA TATSUO
分类号 B41J2/44;H04N1/113;H04N1/23 主分类号 B41J2/44
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