| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate having at least an antireflective silicone resin film deposited on an organic film and a photoresist film consecutively layered thereon, in which the antireflective silicone resin film has both of excellent resist compatibility and high etching durability upon etching of the organic film, and a pattern with higher accuracy is thereby formed. <P>SOLUTION: The substrate comprises at least an antireflective silicone resin film deposited on an organic film and a photoresist film consecutively layered thereon, wherein the antireflective silicone resin film comprises a lower silicone resin film and an upper silicone resin film having a silicone content smaller than that of the lower silicone resin film. <P>COPYRIGHT: (C)2007,JPO&INPIT |
