发明名称 MANUFACTURING METHOD OF COLOR FILTER SUBSTRATE, COLOR FILTER SUBSTRATE, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of color filter substrate which can make transmission brightness of a color filter uniform in a region divided by barrier walls. <P>SOLUTION: The conductive barrier walls 2 are formed on a substrate 1; an ink (i) that contains pigment having a polarity is disposed on the region 3 divided by the barrier walls 2 and, thereafter, the ink (i) is dried to form the color filter layer 4 while applying a voltage to the barrier walls 2 and charging the barrier walls 2 into the polarity opposite to that of the pigment. According to the method, although the thickness of the color filter layer 4 becomes thinner on the periphery part than on the center part, the pigment is drawn near the charged barrier walls 2 and, thereby, pigment concentration in the color filter layer 4 becomes higher on the periphery part than on the center part. Accordingly, the transmission brightness of a color filter layer 4 can be made uniform in the region 3. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007156073(A) 申请公布日期 2007.06.21
申请号 JP20050350455 申请日期 2005.12.05
申请人 SEIKO EPSON CORP 发明人 KATAUE SATORU
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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