| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid crystal display device which is provided with routing lines connected to scanning lines above and below a gate insulating film in parallel, the lower-layer routing lines being minimized in pitch and upper-layer routing lines being made not apt to short-circuit to each other even if a pattern defect (unnecessary film residue) is caused when the upper-layer routing lines are formed by photolithography. SOLUTION: An interval L of the upper-layer routing lines 7 is set to (2W+D) obtained by adding an interval D of the lower-layer routing lines 6 to the double of a line width W of the lower-layer routing lines 6. The interval L of the upper-layer routing lines 7 which is thus set to 2W+D is much larger than the interval D of the lower-layer routing lines 6, so the pitch (W+D) of the lower-layer routing lines 6 is minimized and even if the pattern defect (unnecessary film residue) is caused when the upper-layer routing lines 7 are formed by photolithography, the upper-layer routing lines 7 are made not apt to short-circuit to each other. COPYRIGHT: (C)2007,JPO&INPIT
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