发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 A semiconductor device which combines reliability and the guarantee of electrical characteristics is provided. A power MOSFET and a protection circuit formed over the same semiconductor substrate are provided. The power MOSFET is a trench gate vertical type P-channel MOSFET and the conduction type of the gate electrode is assumed to be P-type. The protection circuit includes a planar gate horizontal type offset P-channel MOSFET and the conduction type of the gate electrode is assumed to be N-type. These gate electrode and gate electrode are formed in separate steps.
申请公布号 US2007138566(A1) 申请公布日期 2007.06.21
申请号 US20060610704 申请日期 2006.12.14
申请人 SUZUKI HIROKATSU;FUJIKI ATSUSHI;NAKAZAWA YOSHITO 发明人 SUZUKI HIROKATSU;FUJIKI ATSUSHI;NAKAZAWA YOSHITO
分类号 H01L29/94;H01L21/8238 主分类号 H01L29/94
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