LIQUID FOR LIQUID IMMERSION EXPOSURE PROCESS, AND METHOD OF FORMING RESIST-PATTERN USING SAME

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern using liquid for a liquid immersion exposure process having extremely high transparency, and a refractive index that is higher than that of water at a wavelength range of 200 nm or smaller.

SOLUTION: The resist pattern is formed by using the liquid for a liquid immersion exposure process containing a phosphor compound having a specific molecular structure at a wavelength range of 200 nm or smaller.

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