ANTIREFLECTION FILM, OPTICAL ELEMENT, OPTICAL SYSTEM, EXPOSER AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an antireflection film having a desired antireflection characteristic for two wavelength regions.

SOLUTION: The antireflection film is composed of a multilayer film formed by laminating 4 to 12 layers in which the reflectance of exposure light of wavelength 320 to 450 nm is 1.5% or less, and the reflectance of infrared light of wavelength 800 nm or more (in particular, 880 nm) as alignment light is 2% or less.

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