| 摘要 |
PROBLEM TO BE SOLVED: To provide an improved cleaning and etching composition which can furnish high smoothness and high gloss together with minimizing the damage of substrate when on cleaning and etching the surface of SiO<SB>2</SB>on the substrate. SOLUTION: The composition comprises (a) a fluoride salt and (b) sulfonic acid and/or sulfonate, wherein sulfonic acid and/or sulfonate is at least one selected from the group consisting of sulfamic acid (NH<SB>2</SB>SO<SB>3</SB>H), sulfosalicylic acid dehydrate (HO<SB>3</SB>SC<SB>6</SB>H<SB>3</SB>(OH)COOH 2H<SB>2</SB>O), ammonium sulfamate (NH<SB>4</SB>SO<SB>3</SB>NH<SB>2</SB>), sulfonyl amide ((NH<SB>2</SB>)C<SB>6</SB>H<SB>4</SB>SO<SB>2</SB>), and sodium sulfosalicylate (NaO<SB>3</SB>SC<SB>6</SB>H<SB>3</SB>(OH)COOH 2H<SB>2</SB>O). COPYRIGHT: (C)2007,JPO&INPIT
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