发明名称 EXPOSURE METHOD FOR MANUFACTURE OF LAMINATED SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and method for manufacturing a laminated solid semiconductor device with a good yield. SOLUTION: The size and formation position of each semiconductor device are adjusted considering a wafer deformation caused by heating treatment in an electrode joining step, the individual semiconductor devices are arranged on wafers, the wafer deformation when the semiconductor devices are formed in an alignment step necessary for lamination is calculated, the calculated deformation is corrected upon join, and then the wafers are joined. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007158200(A) 申请公布日期 2007.06.21
申请号 JP20050354251 申请日期 2005.12.08
申请人 NIKON CORP 发明人 TANAKA YASUAKI
分类号 H01L25/18;H01L25/065;H01L25/07 主分类号 H01L25/18
代理机构 代理人
主权项
地址