Gas barrier film, method of producing the same and stimulable phosphor panel

摘要

A gas barrier film includes a substrate film and a gas barrier layer formed on the substrate film. The gas barrier layer is an inorganic compound layer that is made of an inorganic compound having a grain size of 3 nm to 20 nm and has grain boundaries at intervals of 1 nm to 20 nm. A stimulable phosphor panel includes a substrate, a stimulable phosphor layer formed on the substrate and the gas barrier film with which the stimulable phosphor layer is covered and sealed. A gas barrier film producing method prepares the substrate film and performs impedance controlled reactive sputtering on the substrate film at a film deposition pressure of 0.01 Pa to 0.13 Pa to form the gas barrier layer on the substrate film to thereby produce the gas barrier film.