| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for photo spacers capable of enhancing resist hardness after exposure, excellent in developer resistance, and capable of forming high-quality photo spacers free of defects such as a dot chip, and to provide a substrate with spacers using the composition, a method for producing the substrate and a liquid crystal display device. <P>SOLUTION: The photosensitive resin composition for photo spacers comprises at least an ethylenically unsaturated compound, a photopolymerization initiator and a binder and is used in an exposure system by which a two-dimensional image is formed by relatively scanning while modulating monochromatic light or a bright line within a range of 350-420 nm based on image data with two-dimensionally arranged spatial light modulation devices. The OD of the photosensitive resin composition at the wavelength of the monochromatic light or bright line is in a range of 0.05-1.2 and the binder contains a crosslinking group. There are also provided the substrate with spacers using the composition, the method for producing the substrate and the liquid crystal display device. <P>COPYRIGHT: (C)2007,JPO&INPIT |
