发明名称 PATTERN DESIGNING METHOD AND DROPLET ARRANGING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce the area dependence of the thickness of a real pattern obtained in an ink jet process. SOLUTION: The pattern designing method has a first process of matching two or more two-dimensionally arranged blocks 1 in a drawing area containing a design pattern, a second process of detecting a standard block 1R overlapping with the design pattern in at least a specified ratio of area, a third process of recording groups 1G of blocks containing the detected standard block 1R as the groups 1GR of superimposed blocks and a fourth process of determining a block 1 on which droplets are to be arranged, within an arbitrarily selected group 1G of blocks, according to the relative position and number of the groups 1GR of superimposed blocks adjacent to the selected group 1G of blocks. If the selected group 1G of blocks and all the groups 1G adjacent to the selected 1G are groups 1GR of superimposed blocks, the blocks 1G on which droplets are to be arranged is thinned within the selected group 1G of blocks. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007152167(A) 申请公布日期 2007.06.21
申请号 JP20050347546 申请日期 2005.12.01
申请人 SEIKO EPSON CORP 发明人 MIZUGAKI KOICHI
分类号 B05D1/26;B05D3/00;H05K3/00;H05K3/10 主分类号 B05D1/26
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