发明名称 METHOD OF FABRICATING SUBSTRATE WITH NANO PATTERN AND LIGHT EMITTING DEVICE USING THE SUBSTRATE
摘要 A method for manufacturing a substrate with a nano pattern and a light emitting device using the substrate manufactured thereby are provided to realize mass-production and to economize substrate fabrication costs by performing an etching process on the substrate using an agglomerated portion of a nano size as an etch mask. A protection layer is formed on a substrate(100). A thin film including metal is formed on the protection layer. A plurality of agglomerated portions of nano size are formed on the protection layer by performing a heat treatment on the thin film. The protection layer is vertically etched by using the plurality of agglomerated portions as an etch mask. The plurality of agglomerated portions are removed. A plurality of nano rods(105) are formed on the resultant structure by performing a vertical etching process on the substrate using the protection layer as an etch mask.
申请公布号 KR20070063731(A) 申请公布日期 2007.06.20
申请号 KR20050123861 申请日期 2005.12.15
申请人 LG ELECTRONICS INC.;LG INNOTEK CO., LTD. 发明人 KIM, JONG WOOK;CHO, HYUN KYONG
分类号 H01L33/32 主分类号 H01L33/32
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