| 摘要 |
PROBLEM TO BE SOLVED: To remove resist residue generated at the time of forming a circuit with high performance by using at least one of an alkylamine and an alkylammonium hydroxide, water and N,N-bis(2-hydroxyethyl)cyclohexylamine as essential components. SOLUTION: The resist remover compsn. consists essentially of at least one of an alkylamine and an alkylammonium hydroxide, water and 1.0-20.0 wt.% N,N-bis(2-hydroxyethyl)cyclohexylamine of the formula. In the case of <1.0 wt.%, the resist residue removing performance of the compsn. lowers. In the case of >20.0 wt.%, the viscosity of the compsn. increases and the resist residue removing performance lowers. Monomethylamine may be used as the alkylamine and choline may be used as the alkylammonium hydroxide. |
