发明名称 |
RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
摘要 |
A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the α-position to the hydroxyl group has at least one electron attractive group. |
申请公布号 |
KR100730531(B1) |
申请公布日期 |
2007.06.20 |
申请号 |
KR20057022911 |
申请日期 |
2005.11.30 |
申请人 |
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发明人 |
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分类号 |
G03F7/004;G03F7/033;C08F2/38;C08F220/28;G03F7/039;H01L21/027;H01L21/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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