| 摘要 |
A method for manufacturing an LCD(Liquid Crystal Display) is provided to shorten the manufacturing time, by fixing two substrates and simultaneously performing a plasma chemical vapor deposition process, a sputtering process, and an etching process on the fixed substrates. Two transparent substrates(110a,110b) are fixed by a clamping unit(113). Metal layers are deposited on both surfaces of the fixed substrates. After separating the fixed substrates, the metal layers are pattern-etched to form gate lines and gate electrodes on respective substrates. After fixing the substrates, gate insulating layers, amorphous silicon layers, and impurity-doped amorphous silicon layers are formed on both surfaces of the fixed substrates. After separating the fixed substrates, the amorphous silicon layers and the impurity-doped amorphous silicon layers are pattern-etched to form active layers and ohmic contact layers on respective substrates. After fixing the substrates, metal layers are formed on both surfaces of the fixed substrates. After separating the fixed substrates, the metal layers are pattern-etched to form source and drain electrodes on respective substrates. After fixing the substrates, passivation layers are deposited on both surfaces of the fixed substrates. The passivation layers are pattern-etched to form drain contact holes in the passivation layers. Transparent conductive layers are deposited on the passivation layers, respectively. After separating the fixed substrates, pixel electrodes are formed on respective substrates. |
