发明名称 |
Method and apparatus for depositing charge and/or nanoparticles |
摘要 |
A method and apparatus for use in depositing electrical charge and/or nanoparticles is provided. A stamping process is used in which a stamp having a flexible layer such as a flexible semiconductor layer applies a charge pattern on a substrate. Other techniques include lithographic patterning, the use of pre-patterned dissimilar materials, deposition by ions or radiation, the use of differing work functions, the use of liquid phase materials. Deposition monitoring techniques and apparatuses are also provided.
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申请公布号 |
US7232771(B2) |
申请公布日期 |
2007.06.19 |
申请号 |
US20040982179 |
申请日期 |
2004.11.04 |
申请人 |
REGENTS OF THE UNIVERSITY OF MINNESOTA |
发明人 |
JACOBS HEIKO O.;BARRY CHAD |
分类号 |
H01L21/31;B05D1/12;B05D5/00;G03G5/02;G03G5/153;H01L21/469 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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