| 摘要 |
A method of fabricating an electronic structure by providing a conductive layer (102), providing a dielectric layer (100) over the conductive layer (102), providing first and second openings (104, 106) through the dielectric layer (100), providing first and second conductive bodies (108, 110) in the first and second openings (104, 106) respectively and in contact with the conductive layer (102), providing a memory structure (126) over the first conductive body (108), providing a protective element (134) over the memory structure (126), and undertaking processing on the second conductive body (110). |
