发明名称 |
Lithographic projection apparatus and reflector assembly for use therein |
摘要 |
A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.
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申请公布号 |
US7233009(B2) |
申请公布日期 |
2007.06.19 |
申请号 |
US20030647120 |
申请日期 |
2003.08.25 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SCHUURMANS FRANK JEROEN PIETER;BAKKER LEVINUS PIETER |
分类号 |
G03F7/20;G21K1/06;G21K5/00;G21K5/02;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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