NANOTIP FOR ELECTRON RADIATION, METHOD FOR MANUFACTURING THE SAME AND NANOTIP LITHOGRAPHY WITH THE SAME

摘要

A nano-tip electron emission source, a method for manufacturing the same, and a nano-tip lithography apparatus having the same are provided to perform easily a control process by controlling one electron to be used in a lithography process. A nano-tip lithography apparatus includes an electron emission source and a wafer(201). The electron emission source includes a nano-tip array which is formed with a plurality of nano-tips. The electron emission source emits electrons from the nano-tip by a predetermined voltage. The wafer is arranged opposite to the nano-tip array of the electron emission source. Photoresist(202) exposed by emitted electrons is coated on the wafer.