APPARATUS FOR LOADING WAFER AT THE IMPLANTER

摘要

A wafer loading apparatus of an ion implanter is provided to improve the yield by preventing particles from being generated on a rear surface of a wafer using a pad with a planarized plane capable of maximizing a contact area between the pad and the rear surface of the wafer. A wafer loading apparatus of an ion implanter includes a robot arm for transferring a wafer(10) from a wafer cassette to an aiming position, a platen for rotating the wafers transferred by the robot arm, a wafer loading unit, and a pad. The wafer loading unit is used for loading stably a rear surface of the wafer at an edge portion of the platen. The pad(50) is installed on the wafer loading unit. The pad includes a planarized plane capable of preventing the generation of voids between the rear surface of the wafer and the wafer loading unit.